검색어 : 통합검색[Series on semiconductor science and technology]
총 706건 중 706건 출력
, 1/71 페이지
-
1
- Physics and applications of semiconductor microstructures. By M. Jaros, Series on Semiconductor Science and Technology 1, Oxford Science Publications, Oxford 1989, xi, 245 pp. bound, £ 30.—ISBN 0‐19‐851994‐X
- von Kä nel, Hans; Laboratorium fü r Festkö rperphysik der ETH ETH‐ Hö nggerberg, CH‐ 8093 Zü rich (Switzerland); (Advanced materials, v.2, 1990, pp.55-56)
-
2
- <unl type='bar'>Low-dimensional semiconductors, materials, physics, technology, devices, series on semiconductor science and technology : M.J. Kelly, University of Surrey, Clarendon Press, Oxford, 1995, 546 pages, ISBN-0-19-851781-5 (Hbk), ISBN-0-851980-7 (Pbk)
- Mazalov, Lev N.; ; (Materials research bulletin, v.32, 1997, pp.1325-1326)
-
3
- Integrated nanoscale electronics and optoelectronics: Exploring nanoscale science and technology through semiconductor nanowires
- Huang, Yu; Lieber, C. M.; Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue 16-244, Cambridge, MA 02139,USA; Chemistry and Materials Science Directorate, Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, CA 94551, USA; Department of Chemistry and Chemical Biology, Division of Engineering and Applied Sciences, Harvard University, Cambridge, MA 02138, USA; Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue 16-244, Cambridge, MA 02139,USA; Chemistry and Materials Science Directorate, Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, CA 94551, USA; Department of Chemistry and Chemical Biology, Division of Engineering and Applied Sciences, Harvard University, Cambridge, MA 02138, USA; (Pure and applied chemistry. : Chimie pure et appliqueé, v.76, 2004, pp.2051-2068)
-
4
- Green science: Advanced building design technology to mitigate energy and environment
- Hossain, Md. Faruque; Department of Civil and Urban Engineering, New York University, 6 Metro Tech Center, Brooklyn, NY 11201, USA; (Renewable & sustainable energy reviews, v.81, 2018, pp.3051-3060)
-
5
- Science Based New Silicon Technologies Exhibiting Super High Performance due to Radical-reaction-based Semiconductor Manufacturing
- Tadahiro Ohmi; Hiroaki Tanaka; Tomoyuki Suwa; Xiang Li; Rihito Kuroda; Tohoku University; Tohoku University; Tohoku University; Tohoku University; Tohoku University; (Journal of the Korean Physical Society, v.59, 2011, pp.391-401)
-
6
- P. R. Morris. A History of the World Semiconductor Industry. IEE History of Technology Series 12. London: Peter Peregrinus on behalf of the Institution of Electrical Engineers, 1990. Pp. 171. ISBN 0-86341-227-0. £32.
- Hackmann, Willem; ; (The British journal for the history of science, v.25, 1992, pp.495-496)
-
7
- An empirical study on knowledge integration, technology innovation and experimental practice
- Hung, H.F.; Kao, H.P.; Chu, Y.Y.; ; (Expert systems with applications, v.35, 2008, pp.177-186)
-
8
- A Novel Si–GaN Monolithic Integration Technology for a High-Voltage Cascoded Diode
- Ren, Jie; Liu, Chao; Tang, Chak Wah; Lau, Kei May; Sin, Johnny K. O.; Department of Electronic and Computer Engineering, The Hong Kong University of Science and Technology, Hong Kong; Department of Electronic and Computer Engineering, The Hong Kong University of Science and Technology, Hong Kong; Department of Electronic and Computer Engineering, The Hong Kong University of Science and Technology, Hong Kong; Department of Electronic and Computer Engineering, The Hong Kong University of Science and Technology, Hong Kong; (IEEE electron device letters : a publication of the IEEE Electron Devices Society, v.38, 2017, pp.501-504)
-
9
- Large‐Area Field Potential Imaging Having Single Neuron Resolution Using 236 880 Electrodes CMOS‐MEA Technology
- Suzuki, Ikuro; Matsuda, Naoki; Han, Xiaobo; Noji, Shuhei; Shibata, Mikako; Nagafuku, Nami; Ishibashi, Yuto; Department of Electronics Graduate School of Engineering Tohoku Institute of Technology 35‐ 1 Yagiyama Kasumicho, Taihaku‐ ku Sendai Miyagi 982‐ 8577 Japan; Department of Electronics Graduate School of Engineering Tohoku Institute of Technology 35‐ 1 Yagiyama Kasumicho, Taihaku‐ ku Sendai Miyagi 982‐ 8577 Japan; Department of Electronics Graduate School of Engineering Tohoku Institute of Technology 35‐ 1 Yagiyama Kasumicho, Taihaku‐ ku Sendai Miyagi 982‐ 8577 Japan; Department of Electronics Graduate School of Engineering Tohoku Institute of Technology 35‐ 1 Yagiyama Kasumicho, Taihaku‐ ku Sendai Miyagi 982‐ 8577 Japan; Department of Electronics Graduate School of Engineering Tohoku Institute of Technology 35‐ 1 Yagiyama Kasumicho, Taihaku‐ ku Sendai Miyagi 982‐ 8577 Japan; Department of Electronics Graduate School of Engineering Tohoku Institute of Technology 35‐ 1 Yagiyama Kasumicho,; (Advanced science, v.10, 2023, pp.2207732)
-
10.
- SOPS-SOI Technology and Its Application to the Monolithic Silicon Schottky Diode Mixer : 선택적 산화 다공성 실리콘 기술을 이용한 국부적 유전체 상 실리콘 형성 기술과 단일칩 쇼트키 다이오드 주파수 혼합기 제작 응용
- 하만륜
- Korea Advanced Institute of Science and Technology, 국내박사, xⅲ, 193p., 2004
QUICK MENU
