검색어 : 통합검색[248.4]
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1
- Photodissociation dynamics of ClOOCl at 248.4 and 308.4 nm
- Huang, Wen-Tsung; Chen, Andrew F; Chen, I-Cheng; Tsai, Chen-Hsun; Lin, Jim Jr-Min; Institute of Atomic and Molecular Sciences, Academia Sinica; Institute of Atomic and Molecular Sciences, Academia Sinica; Institute of Atomic and Molecular Sciences, Academia Sinica; Institute of Atomic and Molecular Sciences, Academia Sinica; Institute of Atomic and Molecular Sciences, Academia Sinica; (Physical chemistry chemical physics : PCCP, v.13, 2011, pp.8195-8203)
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2
- Photodissociation cross sections of ClOOCl at 248.4 and 266 nm
- Lien, Chien-Yu; Lin, Wei-Yen; Chen, Hsueh-Ying; Huang, Wen-Tsung; Jin, Bing; Chen, I-Cheng; Lin, Jim J.; Academia Sinica 1 Institute of Atomic and Molecular Sciences, , Taipei 10617, Taiwan; Academia Sinica 1 Institute of Atomic and Molecular Sciences, , Taipei 10617, Taiwan; Academia Sinica 1 Institute of Atomic and Molecular Sciences, , Taipei 10617, Taiwan; Academia Sinica 1 Institute of Atomic and Molecular Sciences, , Taipei 10617, Taiwan; Academia Sinica 1 Institute of Atomic and Molecular Sciences, , Taipei 10617, Taiwan; Academia Sinica 1 Institute of Atomic and Molecular Sciences, , Taipei 10617, Taiwan; Academia Sinica 1 Institute of Atomic and Molecular Sciences, , Taipei 10617, Taiwan; (The Journal of chemical physics, v.131, 2009, pp.174301)
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3
- 100 MW, 248.4 nm, KrF laser excited by an electron beam
- Tisone, G.C.; Hays, A.K.; Hoffman, J.M.; ; (Optics communications, v.15, 1975, pp.188-189)
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4
- Wavelength dependence of gain from 248.2 to 248.4 nm in a KrF discharge laser
- Fedosejevs, R; Shan, X X; Offenberger, A A; Dept. of Electr. Eng., Alberta Univ., Edmonton, Alta., Canada; Dept. of Electr. Eng., Alberta Univ., Edmonton, Alta., Canada; Dept. of Electr. Eng., Alberta Univ., Edmonton, Alta., Canada; (Journal of physics. D, applied physics, v.20, 1987, pp.912-916)
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5.
- J. S. Bach의 'Weihnachtsoratorium, BWV 248'의 연주기법에 관한 연구 : 4,5,6번을 중심으로
- 최용환
- 중앙대학교 예술대학원, 국내석사, ix, 120 p., 2008
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6
- 248. 2 : 4-Diamino-1-methylnaphthalene
- Thompson, Henry William; ; (Journal of the Chemical Society (Resumed), v.1932, 1932, pp.1830-1832)
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7
- Evaluation of deep UV ANR photoresists for 248.4 nm. excimer laser photolithography.
- Thackeray, James W.; Orsula, George W.; Canistro, Dianne; Berry, Amanda K.; ; (フォトポリマ-懇話會誌= Journal of photopolymer science and technology, v.2, 1989, pp.429-443)
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8
- Photodissociation of S4N4. I. 248 nm
- Henshaw, Thomas L.; Ongstad, Andrew P.; Lawconnell, Robert I.; Frank J. Seiler Research Laboratory, United States Air Force Academy, Colorado Springs, Colorado 80840-6528; Frank J. Seiler Research Laboratory, United States Air Force Academy, Colorado Springs, Colorado 80840-6528; Frank J. Seiler Research Laboratory, United States Air Force Academy, Colorado Springs, Colorado 80840-6528; (The Journal of chemical physics, v.96, 1992, pp.53-66)
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9
- World patent information - Yuita, Y. Entwicklungen im patentamt Japans 15 (4), pp. 237-248
- ; ; (World patent information, v.15, 1993, pp.259)
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10
- Some mathematical reminiscencesMarden, Morris. 1990. Mathematics Magazine63(4), 244–248
- ; ; (Historia Mathematica, v., 1991, )
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