검색어 : 통합검색[Matijevic Egon]
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81
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Role of Amine and Carboxyl Functional Groups of Complexing Agents in Slurries for Chemical Mechanical Polishing of Copper
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Gorantla, Venkata R. K.;
Goia, Dan;
Matijević
, Egon;
Babu, S. V.;
;
(Journal of the Electrochemical Society : JES,
v.152,
2005,
pp.G912)
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82
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Reactivity of chromium oxide in aqueous solutions. 1. Oxidative dissolution
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Reartes, Graciela B.;
Morando, Pedro J.;
Blesa, Miguel A.;
Hewlett, Patrick B.;
Matijevic, Egon;
;
(Chemistry of materials : a publication of the American Chemical Society,
v.3,
1991,
pp.1101-1106)
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83
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Reactivity of Chromium Oxide in Aqueous Solutions. 2. Acid Dissolution
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Reartes, Garciela B.;
Morando, Pedro J.;
Blesa, Miguel A.;
Hewlett, Patrick B.;
Matijevic, Egon;
;
(Langmuir : the ACS journal of surfaces and colloids,
v.11,
1995,
pp.2277-2284)
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84
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Removal of Humic Acid by Coagulation and Microflotation
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Mangravite Jr., Francis J.;
Buzzell, Timothy D.;
Cassell, E. Alan;
Matijevic, Egon;
Saxton, Gary B.;
;
(Journal : American water works association,
v.67,
1975,
pp.88-94)
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85
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Uniform Elongated Colloidal HfO<SUB>2</SUB> Particles
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Ocañ
a, Manuel;
Andres, Manuel;
Martinez, Marina;
Serna, Carlos J.;
Matijevic, Egon;
;
(Journal of colloid and interface science,
v.163,
1994,
pp.262-268)
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86
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Preface
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Ast, Teodor;
;
(Pure and applied chemistry. : Chimie pure et appliqueé,
v.77,
2005,
pp.iv-iv)
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87
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Encapsulated inorganic resist technology
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Fedynyshyn, Theodore H.;
Houlihan, Francis M.;
Doran, Scott P.;
Lind, Michele L.;
Sondi, I.;
Matijevic, Egon;
;
(Advances in Resist Technology and Processing XVII,
v.3999,
2000,
pp.627)
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88
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Encapsulated inorganic resist technology applied to 157-nm lithography
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Fedynyshyn, Theodore H.;
Houlihan, Francis M.;
Sinta, Roger F.;
Sworin, Michael;
Goodman, Russell B.;
Doran, Scott P.;
Sondi, I.;
Matijevic, Egon;
;
(Advances in Resist Technology and Processing XVIII,
v.4345,
2001,
pp.308)
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89
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Zeta potential of anatase (TiO<SUB>2</SUB>) in mixed solvents
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Kosmulski, Marek;
Matijević
, Egon;
;
(Colloids and surfaces,
v.64,
1992,
pp.57-65)