검색어 : 통합검색[American Chemical Society. Division of Polymeric Materials: Science and Engineering.]
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11
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Nature as a Model for the Elaboration of New Concepts in Polymer Science
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Percec, V.;
;
(American Chemical Society; Division of Polymeric Materials: Science and Engineering,
v.2000,
2000,
pp.554)
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12
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Engineering the Microenvironment of Crystals Nucleation and Growth Using Micropatterned Polymers
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Aizenberg, I.;
Black, A. J.;
Whitesides, G. M.;
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(American Chemical Society: Division of Polymeric Materials: Science and Engineering,
v.1999,
1999,
pp.2-3)
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13
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Amphiphilic Poly(phenylacetylenes) with PEO Pendants: Synthesis and Their Applications in Crystal Engineering
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Cheuk, K. K. L.;
Lam, J. W. Y.;
Cha, J. A. K.;
Tang, B. Z.;
;
(American Chemical Society; Division of Polymeric Materials: Science and Engineering,
v.2000,
2000,
pp.54-55)
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14
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Molecular Engineering for Improving Spectral Stability and Tuning Electronic Properties of Blue Electroluminescent Polymers
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Yu, W.-L.;
Huang, W.;
Liu, B.;
Lai, Y.-H.;
;
(American Chemical Society; Division of Polymeric Materials: Science and Engineering,
v.2000,
2000,
pp.214-215)
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15
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People
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;
;
(Pigment & resin technology,
v.19,
1990,
pp.24-24)
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16
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People
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;
;
(Pigment & resin technology,
v.15,
1986,
pp.25-25)
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17
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Accelerated Synthesis of Hyperbranched Polyesters Based on BIS-MPA
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Malmstroem, E.;
Trollsaas, M.;
Hawker, C. J.;
Johansson, M.;
;
(American Chemical Society: Division of Polymeric Materials: Polymeric materials science and engineering,
v.1997,
1997,
pp.151-152)
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18
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New Hyperbranched Poly(siloxysilanes) from AB<SUB>2</SUB>, AB<SUB>4</SUB>, and AB<SUB>6</SUB> Monomers: Variation of the Branching Pattern and End-Functionalization
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Miravet, J. F.;
Frechet, J. M. J.;
;
(American Chemical Society: Division of Polymeric Materials: Polymeric materials science and engineering,
v.1997,
1997,
pp.141-142)
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19
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Functional Design of Environmentally Enhanced Water-Soluble Positive-Tone Photoresists
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Havard, J. M.;
Pasini, D.;
Frechet, J. M. J.;
;
(American Chemical Society: Division of Polymeric Materials: Polymeric materials science and engineering,
v.1997,
1997,
pp.424-425)
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20
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A Positive-Working Alkaline Developable Photoresist Based on Benzylether Dendrimer and a Dissolution Inhibitor
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Haba, O.;
Haga, K.;
Ueda, M.;
;
(American Chemical Society: Division of Polymeric Materials: Polymeric materials science and engineering,
v.1997,
1997,
pp.426-427)