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101
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Index to Volume 248
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;
;
(Molecular and cellular biochemistry,
v.248,
2003,
pp.227-230)
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102
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[Fractura ossis temporalis. Progress and consequences of 248 petrous bone fractures]
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Tos, M;
;
(Nordisk medicin,
v.86,
1971,
pp.1032-1033)
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103
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Positive bilayer resists for 248- and 193-nm lithography
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Sooriyakumaran, Ratnam;
Wallraff, Gregory M.;
Larson, Carl E.;
Fenzel-Alexander, Debra;
Di Pietro, Richard A.;
Opitz, Juliann;
Hofer, Donald C.;
LaTulip, Jr., Douglas C.;
Simons, John P.;
Petrillo, Karen E.;
Babich, Katherina;
Angelopoulos, Marie;
Lin, Qinghuang;
Katnani, Ahmad D.;
;
(Advances in Resist Technology and Processing XV,
v.3333,
1998,
pp.219)
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104
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'MNUS 248' (Mesabi™) Strawberry
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Luby, James J.;
Wildung, David K.;
Galletta, Gene J.;
;
(HortScience : a publication of the American Society for Horticultural Science,
v.38,
2003,
pp.481-483)
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105
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[Practura ossi temporalis. The course and sequelae of 248 fractures of the temporal bones]
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Tos, M;
;
(Ugeskrift for læger,
v.133,
1971,
pp.1449-1456)
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106
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Photodissociation dynamics of dichlorocarbene at 248 nm
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Shin, Seung Keun;
Dagdigian, Paul J.;
Department of Chemistry;
Department of Chemistry;
(Physical chemistry chemical physics : PCCP,
v.8,
2006,
pp.3446-3452)
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107
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Reliable Transportation Scheme Based on IP of H.248 Protocol
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DONG, Fang;
HUANG, Hai;
CHEN, Hongchang;
National Digital Switching System Engineering & Technological R&D Center;
PLA Information Engineering University;
National Digital Switching System Engineering & Technological R&D Center;
PLA Information Engineering University;
National Digital Switching System Engineering & Technological R&D Center;
PLA Information Engineering University;
(計算機工程 = Computer engineering,
v.34,
2008,
pp.128-129,134)
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108
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[Acute cerebrovascular disorder and arterial hypertension. Prospective study with 248 patients]
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Fonseca, T;
Cortes, P;
Monteiro, J;
Salgado, V;
Ferro, J;
Franco, A S;
Nogueira, J B;
da Costa, J N;
;
(Revista portuguesa de cardiologia : orgão oficial da Sociedade Portuguesa de Cardiologia = Portuguese journal of cardiology : an official journal of the Portuguese Society of Cardiology,
v.15,
1996,
pp.565-573)
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109
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Characterization Of A UV Resist for 248 nm Lithography
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Shacham-Diamand, Yosi Y.;
Reichmanis, Elsa;
Partlo, William N.;
Oldham, William G.;
University of California, Berkeley (United States);
University of California, Berkeley (United States);
University of California, Berkeley (United States);
(Advances in Resist Technology and Processing VI,
v.1086,
1989,
pp.502)
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110
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Resists For Use In 248 Nm Excimer Laser Lithography
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Orvek, Kevin J.;
Willson, C. Grant;
Palmer, Shane R.;
Garza, Cesar M.;
Fuller, Gene E.;
Texas Instruments Incorporated (United States);
Texas Instruments Incorporated (United States);
Texas Instruments Incorporated (United States);
Texas Instruments Incorporated (United States);
(Advances in Resist Technology and Processing III,
v.631,
1986,
pp.83)