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91
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Aristoph. Nubb. v. 248
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Goram, O.;
;
(Philologus,
v.15,
1860,
pp.29-29)
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92
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Aeschylus, Fr. 248 M
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Dover, K. J.;
;
(The Classical review,
v.14,
1964,
pp.12-12)
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93
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Regeneration of complex Bragg gratings [7503-248]
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Bandyopadhyay, S.;
Canning, J.;
Biswas, P.;
Chakraborty, R.;
Dasgupta, K.;
;
(International Conference on Optical Fiber Sensors,
v.2009,
2009,
pp.7503 71)
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94
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High-etch-rate type 248-nm bottom antireflective coatings
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Enomoto, Tomoyuki;
Houlihan, Francis M.;
Arase, Shinya;
Mizusawa, Kenichi;
Fukuro, Hiroyoshi;
;
(Advances in Resist Technology and Processing XVIII,
v.4345,
2001,
pp.821)
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95
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Contents volume 248 (1991)
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;
;
(Mutation research. Fundamental and molecular mechanisms of mutagenesis,
v.248,
1991,
pp.375-376)
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96
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248 now available online
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;
;
(Soldering & surface mount technology : journal of the SMART (Surface Mount & Related Technologies) Group,
v.15,
2003,
)
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97
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Surface imaging lithography at 248 nm
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Misium, George R.;
Tipton, Mike;
Garza, Cesar M.;
Texas Instruments, Inc., Semiconductor Process and Design Center, Dallas, Texas 75265;
Texas Instruments, Inc., Semiconductor Process and Design Center, Dallas, Texas 75265;
Texas Instruments, Inc., Semiconductor Process and Design Center, Dallas, Texas 75265;
(Journal of vacuum science & technology an official journal of the American Vacuum Society. B, Microelectronics processing and phenomena,
v.8,
1990,
pp.1749-1753)
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98
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Volume 248, No. 2
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;
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(European journal of biochemistry,
v.249,
1997,
pp.912-912)
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99
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Positive bilayer resists for 248- and 193-nm lithography
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Sooriyakumaran, Ratnam;
Wallraff, Gregory M.;
Larson, Carl E.;
Fenzel-Alexander, Debra;
Di Pietro, Richard A.;
Opitz, Juliann;
Hofer, Donald C.;
LaTulip, Jr., Douglas C.;
Simons, John P.;
Petrillo, Karen E.;
Babich, Katherina;
Angelopoulos, Marie;
Lin, Qinghuang;
Katnani, Ahmad D.;
;
(Advances in Resist Technology and Processing XV,
v.3333,
1998,
pp.219)
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100
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Contents of Volume 248
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;
;
(Journal of hydrology,
v.248,
2001,
pp.225-225)